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4th International Symposium on DSA, November 11-13, 2018, Sapporo Park
Hotel, Sapporo, Japan |
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Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning
solution for advanced lithography. Nevertheless, several outstanding issues
need to be resolved before the technique can find its way into mainstream
application. In an effort to identify and help to resolve these remaining
issues, a 4th International Symposium on DSA will be organized as a collaborative
effort between EIDEC, imec, CEA-Leti, and NIST, as a follow-up to the third
edition hosted by U. Chicago and NIST in 2017. DSA2018 will be held at
Sapporo, Japan on Nov. 11-13, 2018 in conjunction with 31st International
Microprocesses and Nanotechnology Conference (MNC2018) on Nov. 13-16, 2018.
The format will be similar as DSA2015, DSA2016 and DSA2017 with an opening
reception, poster session and 2 full days of talks. |
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Copyright(C) Since 2017, DSA Symposium All Rights Reserved. |
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