4th International Symposium on DSA, November 11-13, 2018, Sapporo Park Hotel, Sapporo, Japan

Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for advanced lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application. In an effort to identify and help to resolve these remaining issues, a 4th International Symposium on DSA will be organized as a collaborative effort between EIDEC, imec, CEA-Leti, and NIST, as a follow-up to the third edition hosted by U. Chicago and NIST in 2017. DSA2018 will be held at Sapporo, Japan on Nov. 11-13, 2018 in conjunction with 31st International Microprocesses and Nanotechnology Conference (MNC2018) on Nov. 13-16, 2018. The format will be similar as DSA2015, DSA2016 and DSA2017 with an opening reception, poster session and 2 full days of talks.

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